Designed to provide precisely accurate and highly stable control of pressure fluctuations for flow control applications. HPRL for UPW and chemicals with full shutoff. HPRM prevents clogging in CMP slurry. Pneumatically controlled. Available in 6mm – 32mm (1/4″ – 1″).
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Precisely accurate pressure control for consistent flow control in critical applications.
Highly stable control of pressure fluctuations ensures reliable process performance.
Pneumatically controlled for automated operation and seamless system integration.
HPRL model provides full shutoff capability for UPW and chemical applications.
HPRM internal structure prevents clogging and cohesion in CMP slurry applications.
Fast response time ensures rapid adjustment to pressure fluctuations and process changes.
Utilized for UPW (Ultrapure Water) and chemical applications. Provides full shutoff capability for precise on/off control. Ideal for high purity applications requiring complete isolation.
Internal structure specifically designed to prevent clogging and cohesion in CMP slurry applications. Optimized for abrasive and particulate-laden fluids in semiconductor manufacturing.
Simple, intuitive operation
Superior pressure stability
Rapid pressure adjustment
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